| 简介 |
PROBLEM TO BE SOLVED : To provide a method of eliminating the surface oxide film of titanium or a titanium compound in the dry etching method of a laminated structure of rare metal film and titanium or a titanium compound.
SOLUTION : The dry etching method of dry-etching a laminated substance includes a first layer is of rare metal and a second layer is of titanium or a titanium compound under the first layer, in which includes a first process to generate an oxide film at the surface of the second layer after eliminating the first layer under the patterned mask with the mixed gas including chlorine atom and oxygen atom, a second process to eliminate the oxide film generated at the surface of the second layer using the mixed gas which is mainly formed of chlorine atom, and a third process to eliminate the second layer using the mixed gas which is mainly formed of chlorine atom. |
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