| 简介 |
The device strip process, etching process, or the like essentially a semiconductor, LCD production process for producing a chemical component, which results in large amounts industry as to efficiently control the and moisture to discharge the production facility in relates to exhaust gas control device.
A production facility in the device a device for controlling ignition time, any oil during operation of a production facility in the processing of composition containing and chemical the moisture given off by the destination exhaust gas with and transporting the main duct, said main provide for flow of exhaust gas the sheet is fed through the duct through concentrate concentrated under the adsorbing a reprocessor releasing handled air filtration/purification system in a production facility control device, said control device a, said main duct is installed in the exhaust gas and an incoming inlet of the case, and, said exhaust gas flows in a re-treatment system to flow the cyclone the upper-offset properties, has a wide moreover a lower liquid phase layers moisture, out of exhaust gases by the cyclone chamber and trap and composition particles. Said cyclone trap that define the flow of exhaust gas by forming a predetermined space on the exhaust gases means in the re-treatment system the way to the cyclone chamber and trap housing and, said cyclone trap housing is combined with the moisture particles for exchanging heat between a liquid and a cold water coil provided a heat exchange section and, said heat exchange in conjunction with the liquid phase heat exchange consisting of a discharge that releases moisture characterized in that. |
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