| 简介 |
PROBLEM TO BE SOLVED : To provide a process for forming a fluorine added carbon film in which adhesion is enhanced between the fluorine added carbon film and an underlying film without causing any damage on the underlying film.
SOLUTION : The process for forming a fluorine added carbon film on a substrate to be processed comprises a first step for performing surface treatment of the substrate to be processed with rare gas subjected to plasma excitation by a substrate processing equipment, and a second step for forming a fluorine added carbon film on the substrate to be processed wherein the substrate processing equipment has a microwave antenna electrically connected with a microwave power supply. |
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