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CERIUM BASED POLISHING MATERIAL AND RAW MATERIALS THEREFOR 发明申请

2022-07-31 1310 2146K 0

专利信息

申请日期 2024-11-18 申请号 WOJP04004407
公开(公告)号 WO2005000992A1 公开(公告)日 2005-01-06
公开国别 WO 申请人省市代码 全国
申请人 MITSUI MINING SMELTING CO LTD
简介 A cerium-based polishing material which comprises cerium oxide (CeO2), lanthanum oxide (La2O3) and neodymium oxide(Nd2O3), as rare earth element oxides, and also fluorine (F), characterized in that it has a proportion in weight of the total rare earth elements in terms of oxide (TREO) of 90 wt % or more, a proportion of the weight of cerium oxide in the weight of the total rare earth elements in terms of oxide (CeO2/TREO) is 50 to 65 wt %, and a proportion of the weight of neodymium oxide in the weight of the total rare earth elements in terms of oxide (Nd2O3/TREO) is 10 to 16 wt %. The cerium-based polishing material has excellent polishing characteristics such as the reduction in the generation of flaws and also exhibits enhanced polishing speed.


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