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Methods for manufacturing compound semiconductor and compound insulator using chemical reaction and 发明申请

2022-07-31 2090 376K 0

专利信息

申请日期 2024-11-18 申请号 KR1020047015560
公开(公告)号 KR1020050002916A 公开(公告)日 2005-01-10
公开国别 KR 申请人省市代码 全国
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY; SAMSUNG ELECTRONICS CO LTD
简介 PURPOSE : A method for manufacturing a compound semiconductor and a compound insulator is provided to induce chemical reaction and diffusion of elements by heating a layered structure having an inter layer of a rare earth metal and/or a transition metal sandwiched between dielectric layers. CONSTITUTION : A layered structure is formed by inserting an intermediate layer(120) between a plurality of dielectric layers(110, 130) including oxygen and/or sulfur. The intermediate layer includes rare earth transition metal that is highly reactive to oxygen and sulfur. The layered structure is heated to induce chemical reaction and diffusion of elements. © KIPO 2005


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