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METHOD FOR TREATING RESIST-CONTAINING WASTE LIQUID, AND CHEMICAL TO BE USED IN THE METHOD 发明申请

2022-07-31 1830 38K 0

专利信息

申请日期 2025-02-26 申请号 JP2003183877
公开(公告)号 JP2005013913A 公开(公告)日 2005-01-20
公开国别 JP 申请人省市代码 全国
申请人 NAT INST OF ADV IND TECHNOL; MITSUBISHI CORP
简介 PROBLEM TO BE SOLVED : To provide a method for efficiently treating the resist-containing waste liquid discharged from a printed circuit board manufacturing factory, and a treating agent to be used for treating the resist-containing waste liquid. SOLUTION : Organic matter in the resist-containing waste liquid discharged from the printed circuit board manufacturing factory is precipitated/separated as a hardly soluble substance by adding a rare-earth element compound to the resist-containing waste liquid, adding an acid substance to rare-earth element compound-added liquid to adjust the pH to 0-4 and adding an alkaline substance to the acid substance-added liquid to adjust the pH to 6-12.


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