| 简介 |
PROBLEM TO BE SOLVED : To provide a method of dry-treating surface of insulating film by which no damage is given to a low-k film regardless of the material of the film, and to provide a surface dry-treating device that realizes the method.
SOLUTION : By a method for surface treatment in which the hydrophobic surface of a low-dielectric constant interlayer insulating film is changed to a hydrophilic surface, a highly reliable LSI device can be provided by generating plasma by discharging electricity into a rare gas in a vacuum adjusted to a prescribed pressure and by using the method of dry-treating the surface of the low-dielectric constant interlayer insulating film in which the surface of the interlayer insulating film is exposed to the plasma atmosphere and the surface dry-treating device which realizes the method. |
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