| 简介 |
A method of inhibiting production of projections in a metal deposited-film according to the present invention is characterized by using a vapor deposition apparatus comprising, in a vacuum-treating chamber, an evaporating section for a depositing material, and an accommodating member and/or a holding member for accommodation and/or hold of work pieces, respectively, and, in depositing a metal depositing material on each of the surface of the work pieces with the accommodating member and/or the holding member being made rotated about the horizontal rotational axis thereof, carrying out vapor deposition with a Vickers hardness of a film formed on each of the surface of the work pieces maintained at 25 or more. According to the present invention, production of projections in a metal deposited-film can be effectively inhibited when forming the metal deposited-film of aluminum, zinc or the like on the surface of a work piece such as a rare earth metal-based permanent magnet. |
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