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CERIUM-BASED POLISHING MATERIAL 发明申请

2022-07-31 2020 1107K 0

专利信息

申请日期 2024-11-19 申请号 KR1020047019949
公开(公告)号 KR1020050019733A 公开(公告)日 2005-03-03
公开国别 KR 申请人省市代码 全国
申请人 MITSUI MINING SMELTING CO LTD
简介 A cerium-based polishing material having rare earth metal oxides as the main component thereof which contains fluorine and at least cerium, ranthanum, praseodymium and neodymium as rare earth elements, wherein the proportion (Nd2O3/TREO) of the weight of neodymium oxide in the total weight (TREO) of rare earth elements in oxide terms is 0.001 to 5 wt %%. The use of the above polishing material in the polishing of a face, such as glass, to be polished allows the reduction of the time required for the polishing and also allows more sure inhibition of the occurrence of flaws, as compared to the case of using a conventional cerium based polishing material. © KIPO & WIPO 2007


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