| 申请日期 | 2025-02-22 | 申请号 | JP2015508319 |
| 公开（公告）号 | JP6281565B2 | 公开（公告）日 | 2018-02-21 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | 日立金属株式会社 | ||
| 简介 | A method for removing rare earth impurities from a nickel-electroplating solution by keeping a nickel-electroplating solution containing rare earth impurities and having pH of 4.0-5.1 at 60° C. or higher for a certain period of time, and then removing precipitate generated by the heating from the nickel-electroplating solution by sedimentation and/or filtration. | ||
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