| 简介 |
PROBLEM TO BE SOLVED : To provide a resist composition that enables production of a resist pattern with high resolution.SOLUTION : A resist composition contains a resin that includes a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not include an acid-labile group, a resin including an acid-labile group, an acid generator, and at least one compound selected from the group consisting of a compound represented by formula (II1) and a compound represented by formula (II2), wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; Ris a saturated hydrocarbon group including a fluorine atom; and Ris an alkyl group which may have a substituent, an alicyclic hydrocarbon group or the like. |
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