| 简介 |
PROBLEM TO BE SOLVED : To provide a resist composition that enables production of a resist pattern with excellent focus margin (DOF).SOLUTION : A resist composition contains a resin that has a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not have an acid-labile group, a resin having an acid-labile group, and an acid generator represented by formula (II), wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; Ris a saturated hydrocarbon group having a fluorine atom; Qand Qare independently a fluorine atom or a perfluoroalkyl group; Lis *-CO-O-L- or *-CH-O-L-, * is direct link to -C(Q)(Q)-, and Land Lare independently a divalent saturated hydrocarbon group; a ring Wis a heterocycle; and Z1is an organic cation. |
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