| 简介 |
PROBLEM TO BE SOLVED : To provide a resist composition that enables production of a resist pattern with an excellent exposure margin (EL).SOLUTION : A resist composition contains a resin that has a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not have an acid-labile group, a resin having an acid-labile group, and an acid generator represented by formula (II), wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; Ris a saturated hydrocarbon group having a fluorine atom; Rand Rare independently a fluorine atom or a perfluoroalkyl group; Lis a divalent saturated hydrocarbon group; a ring Wis a heterocycle; Ris a hydrogen atom or a hydrocarbon group; Ris a hydrocarbon group; m is an integer of 0-6; and Z1is an organic cation. |
客服热线：
手机版
二维码
