| 简介 |
Embodiments of the present disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component includes a coating layer that provides a fluorine-rich surface. In one embodiment, the chamber component for use in a plasma processing apparatus includes a body including an outer layer comprising yttria and a coating layer formed thereon, wherein the coating layer comprises an yttrium fluoride containing material. Accordingly, the present invention can promote the plasma resistance and quality stability of the chamber component.(312) First supply source(314) Second supply source(316) DrainCOPYRIGHT KIPO 2018 |
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