| 简介 |
PROBLEM TO BE SOLVED : To provide a novel compound having an excellent base generating ability, a photosensitive resin composition using the same, and a cured product thereof.SOLUTION : The compound is represented by general formula (1) where Rand Rare independently a hydrogen atom, an optionally substituted 1-20C aliphatic hydrocarbon group, respectively, or the like; and R, R, R, R, R, and Rare independently a hydrogen atom, a cyano group, a nitro group, -OR, -COOR, -CO-R, -SR, a halogen atom, an optionally substituted 1-20C aliphatic hydrocarbon group, or the like. respectively. |
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