| 简介 |
The invention is a novel sputter deposition process for thin film phosphors that provide high luminance and colors required for TV applications. The method is a dual source sputtering method for the deposition of a thin film phosphor composition onto a substrate and comprises providing a metal as a first source; providing a sulfur bearing compound as a second source; doping the first or second source with a rare earth activator; and applying sufficient current to the first and second sources in a sulfur containing atmosphere to effect sputtering of the first and second targets and deposition of the phosphor composition onto the substrate.
© KIPO & WIPO 2007 |
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