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SPUTTERING TARGET FOR PHOTOMAGNETIC DISK RECORDING FILM 发明申请

2022-07-31 2550 51K 0

专利信息

申请日期 2025-02-27 申请号 JP2003280936
公开(公告)号 JP2005048229A 公开(公告)日 2005-02-24
公开国别 JP 申请人省市代码 全国
申请人 SUMITOMO METAL MINING CO; HITACHI MAXELL
简介 PROBLEM TO BE SOLVED : To provide a sputtering target for a photomagnetic disk recording film in which the sticking of a sputtering-back film is hard to occur, and which is therefore suitable for obtaining high using efficiency.SOLUTION : The coercive force of the sputtering target is controlled to 6.0×105A/m to 8.1×105A/m. The target comprises one or more selected from rare earth elements, one or more selected from the group consisting of Fe, Co and Ni, and selectively, one or more selected from the group consisting of Cr, Al, Sn and In.


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